New ALD system to power Adisyn’s graphene push toward next-gen chips

Delivery of the ALD system marks a major step toward commercialising Adisyn’s next-gen chips.

Special Report: Adisyn has delivered a key ALD system to fast-track its graphene R&D, marking a major step toward commercialising next-gen chip materials for AI and 5G.

Special Report: Adisyn has delivered a key ALD system to fast-track its graphene R&D, marking a major step toward commercialising next-gen chip materials for AI and 5G.

Adisyn Ltd (ASX: AI1) has delivered its current-generation Atomic Layer Deposition (ALD) system to wholly owned subsidiary 2D Generation.

This advanced system, made by Finnish company Beneq, was acquired as part of Adysyn’s broader strategy to commercialise its low-temperature ALD graphene technology.

Funding for the purchase of this system was already earmarked in the company’s capital raising announced in January this year, which identified the system as a key investment to support Adisyn’s R&D capabilities.

After making an initial deposit in November, Adisyn has now paid Beneq an additional $600,000 upon reaching this delivery milestone, with a further $150,000 to be paid once the system is successfully commissioned.

The ALD system delivered to 2D Generation’s research facility will be fully set up and tested.

This includes adjusting the system, running test cycles and connecting it to the company’s updated infrastructure facilities.

“The delivery of this state-of-the-art ALD system is a strategic step for Adisyn,” said Adisyn chairman Kevin Crofton.

Adisyn said it would provide further updates once the system was fully set up and full-scale testing began. At that stage, the company plans to share the results of its R&D milestones as they are reached.

Raising the bar with infrastructure upgrade

Adisyn is positioned in the global race to bring graphene into advanced semiconductor applications.

Graphene, a material celebrated for its exceptional electrical, thermal and mechanical properties, is notoriously difficult to integrate due to high-temperature requirements.

The ALD machine is central to overcoming that hurdle, allowing graphene coatings to be deposited at much lower temperatures compatible with existing chip manufacturing processes.

To prepare for the ALD system’s arrival, Adisyn has completed a major upgrade of its R&D facility in Israel, creating an environment optimised for high-level semiconductor research.

These upgrades include next-generation electrical systems designed to support high-precision instruments, as well as advanced temperature and humidity controls that help maintain consistency and reliability in the highly sensitive deposition processes.

After months of careful planning, engineering work and focused effort, the facility is now ready to support one of the most advanced and precise graphene research environments in the industry.

Enabling next-gen graphene testing

The delivery of the new ALD system adds to Adisyn’s existing access to a Beneq TFS 200 system at Tel Aviv University’s Jan Koum Center for Nanoscience and Nanotechnology -  a strategic partnership it announced in March.

With access to two state-of-the-art ALD systems in two industry-standard lab environments, Adisyn is positioned to carry out a wide range of advanced testing.

Importantly, the dual-system setup enables parallel development of Adisyn’s proprietary low-temperature graphene deposition process, potentially accelerating its R&D timelines.

The company will also be able to systematically test graphene deposition on different types of interconnect surfaces, both metallic and non-metallic.

It will evaluate important properties such as interface adhesion, electrical resistivity and the uniformity of layers at the atomic scale.

In addition, Adisyn can run experiments on diffusion barriers, capping layers and graphene-metal composites to improve signal integrity and manage heat more effectively.

The company also plans to validate how well its processes align with industry-standard semiconductor workflows, especially at sub-5nm geometries.

These experiments aim to prove that Adisyn’s ALD process can consistently produce high-quality graphene films at temperatures suitable for modern chip manufacturing,  a challenge the industry has struggled to solve.

Adisyn to accelerate interconnect breakthrough

With two ALD systems, Adisyn said it was now able to fast-track development through parallel and simultaneous testing, data collection and IP development at both facilities.

The company said today’s milestone supported its goal of developing next-generation semiconductor materials.

These materials aim to solve key challenges in miniaturisation, energy efficiency and heat management for AI, 5G and high-performance computing.

“With this advanced capability up and running, we can aggressively pursue the validation of our graphene interconnect technology across multiple dimensions: material science, engineering integration and industry compatibility,” said Crofton.

“We are closing the gap between breakthrough science and commercial application.”

This article was developed in collaboration with Adisyn, a Stockhead advertiser at the time of publishing.

This article does not constitute financial product advice. You should consider obtaining independent advice before making any financial decisions.